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About EAG

Lab Director

Mr. Jeff Shallenberger

Mr. Jeff Shallenberger
Director of Analytical Services, New Jersey and Massachusetts

Mr. Shallenberger joined Evans East in 1992 as an analyst and in 1997 was named senior analyst. In 1998 he was appointed assistant director of the Materials Research Institute at Pennsylvania State University and in 2001 also became director of the Materials Characterization Laboratory. In December 2005 he became Director of Analytical Services at EAG-New Jersey.

Mr. Shallenberger received his B.S. and M.S. degrees from Penn State University in Materials Science.

Publications

  • "Alternating Polyester/Fluoroalkene Copolymers: Combining High hydrophobicity with Degradability”- S. Borkar, A. Sen, J. R. Shallenberger, Journal of Polymer Science Part A: Polymer Chemistry, (2005) in press

  • "Study of the Effect of Silicon Surface Treatment In EOT In High-k Dielectric MOS Gate Stack”- K. Chang, K. Shanmugasundaram, D.-O. Lee, P. Roman J. Shallenberger, F.-M. Chang, J. Wang, R.Beck P. Mumbauer, R. Grant, and J. Ruzyllo, Proceedings of the Electrochemical Society, PV 2003-26 (2004) 78

  • "Reversing of Silicon Surface Aging By Lamp Cleaning”- K. Shanmugasundaram, K. Chang, J. Shallenberger, A. Danel, F. Tardif, and J. Ruzyllo, Proceedings of the Electrochemical Society, PV 2003-26 (2004) 347

  • "Adsorption of Polyamides and Polyamide-Silane Mixtures at Glass Surfaces”- JR Shallenberger, E. Metwalli, CG Pantano, FN Tuller, DF Fry, Surface Interface Analysis, 35 (8) 667 (2003)

  • "Surface analysis of 24% lead crystal glass articles: correlation with lead release”- Guadagnino E, Verita M, Geotti-Bianchini F, Shallenberger J, Pantano CG, Glass Technology, 43 (2): 63-69 (2002)

  • "SiO2 thickness determination by x-ray photoelectron spectroscopy, Auger electron spectroscopy, secondary ion mass spectrometry, Rutherford backscattering, transmission electron microscopy, and ellipsometry”- Cole DA, Shallenberger JR, Novak SW, et al., Journal Vaccum Science Technolgy B 18 (1): 440 (2000)

  • "Characterization of Silicon Oxynitride Thin Films by X-ray Photoelectron Spectroscopy”- JR Shallenberger, D.A. Cole and S.W. Novak, Journal Vaccum Science Technology A., 17(4) 1086 (1999)

  • "Recent Advances in XPS Characterization of Ultra-thin Oxides”- JR Shallenberger, D.A. Cole, D.F. Downey, S. Falk and Z. Zhao, Ion Implantation Technology Proceedings, 1998 International Conference on , Vol. 1, 566 (1999)

  • "Effects of annealing on X-ray-amorphous CVD W-Si-N barrier layer materials”- Gokce OH, Amin S, Ravindra NM, Szostak DJ, Paff RJ, Fleming JG, Galewski CJ, Shallenberger J, Eby R, Thin Solid Films, 353 (1-2): 149 (1999)

  • "Determination of chemistry and microstructure of SiOx (0.1 < x < 0.8) films by x-ray photoelectron spectroscopy”- JR Shallenberger, JVST A 14(3) 693 (1996)

  • "XPS and SIMS Characterization of Tin-Oxide Coatings on Glass”- C.G. Pantano, T.H. Buyuklimanli, J. Shallenberger, F. Geotti-Bianchini, M. Verita and S. Hreglich, Glastech. Ber. Glass Sci. Tech. 68 C1 (1995)

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