Ion Channeling

Ion channeling is an ion scattering technique used for thin film analysis that takes advantage of the material properties of single crystals. When the He++ ion beam is properly aligned with the crystalline axis of a single crystal sample, the backscattering signal drops dramatically. This effect can be used to measure the crystallographic quality of the sample with respect to depth. Applications include profiling crystal quality after different treatments (ion implant, annealing, crystal growth) or determining the thickness of amorphous layers.

Very few independent labs offer this unique analytical service, and none can match Evans Analytical Group®’s (EAG) depth and breadth of experience. We routinely analyze a wide range of materials, including very thin films. Plus, you can count on fast turnaround times, accurate data, and person-to-person service, ensuring you understand the analytical test results and what they mean for your material or process.

View Application Notes

Ideal Uses for Ion Channeling Analysis		Relevant Industries for Ion Channeling Analysis
Crystallographic analysis of thin films Crystal damage/defect profiling Determining percent amorphization Determining thickness of amorphized layers		Defense Semiconductor Telecommunications
Strengths of Ion Channeling Analysis		Limitations of Ion Channeling Analysis
Non-destructive depth profiling Quantitative determination of amorphization and defect density without standards Whole wafer analysis (150, 200, 300 mm) as well as irregular and large samples Conductor and insulator analysis		Large analysis area (~2 mm) Useful information limited to top ~1 μm  of samples

Application Notes