Particle Induced X-ray Emission (PIXE)

Particle Induced X-ray Emission (PIXE) is performed simultaneously with Rutherford Backscattering Spectroscopy (RBS). During RBS analysis, characteristic x-rays are emitted from the sample, similar to those measured during EDS analysis. However, because the sample is bombarded with high energy He++ ions, there is little or no Bremstrahhlung background signal.

The energy from the collected x-rays can be used to distinguish between two elements that are close in mass, and therefore emit a single signal using traditional RBS. Measuring the intensity of the signal allows for quantification of each element. While it is not possible to depth profile with PIXE, the technique is a useful complement to RBS, helping to resolve interferences and allow for more accurate quantification.

Ideal Uses for PIXE Analysis		Relevant Industries for PIXE Analysis
Optimizing traditional RBS data for thin film analysis Identifying high-Z elements Quantifying ratios of elements that cannot be resolved by RBS		Aerospace Defense Semiconductor Telecommunications
Strengths of PIXE Analysis		Limitations of PIXE Analysis
Non-destructive, quantitative analysis of elements heavier than Si Identification of elements that RBS cannot resolve		No depth information