X-ray Fluorescence (XRF)

X-ray Fluorescence (XRF) is a non-destructive technique that is used to quantify the elemental composition of solid and liquid samples. X-rays are used excite atoms in the sample, causing them to emit x-rays with energies characteristic of each element present. The intensity and energy of these x-rays are then measured. XRF is capable of detecting elements from Al-U in concentrations from PPM range to 100%. Because X-rays are used to excite the sample depths as great as 10µm can be analyzed. Through the use of appropriate reference standards, XRF can accurately quantify the elemental composition of both solid and liquid samples.

Ideal Uses for XRF Analysis		Relevant Industries for XRF Analysis
Measuring metal film thickness up to several microns Full wafer mapping (up to 300mm wafers) of film thickness with high precision and accuracy Elemental identification in unknown solids, liquids, and powders Identification of metal alloys		Aerospace Automotive Data Storage Defense Electronics Industrial Products Lighting Polymer Semiconductor
Strengths of XRF Analysis		Limitations of XRF Analysis
Non-destructive Whole wafer analysis (200 and 300 mm) as well as wafer pieces and small samples Mapping of full wafers No sample preparation requirements Can analyze areas as small as 30µm Can analyze liquids and solids Sampling depth as great as 10µm		Cannot detect elements lighter than Al For high accuracy requires reference standards similar to test sample No depth profiling capability

Application Notes